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About the LPI
Faculty and Staff
Our Research
Micronutrient Information
Publications
Contact Information
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Biblio
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Algorithms
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Base Sequence
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Computer Communication Networks
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Computers
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Databases, Factual
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Molecular Sequence Data
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Repetitive Sequences, Nucleic Acid
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Sequence Alignment
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Sequence Analysis
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
Software
Jurka J
,
Klonowski P
,
Dagman V
,
Pelton P
. 1996.
CENSOR--a program for identification and elimination of repetitive elements from DNA sequences.
.
Comput Chem. 20(1):119-21.
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